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Next: Alternate Conformations Up: Bulk Solvent Mask Previous: Requirements
Example: Use of a Solvent Mask for Bulk Solvent Correction
Since the bulk solvent density is not usually known, the solvent structure factors must be scaled to the FCALC terms. Also, the grid being transformed has a sharp edge between the solvent and solvent-excluded regions, so Fourier ripples are generated that adversely affect the high-resolution terms. A large temperature factor can be applied to smooth these edge effects. Thus, a DO statement,![${\rm FPART} = {\rm FPART} \; k_{solvent} \; exp(-B_{solvent}s^2/4)$](img464.png)
![$k_{solvent}$](img465.png)
![$B_{solvent}$](img466.png)
![$R$](img6.png)
![$R$](img6.png)
![$k$](img71.png)
![$^-$](img462.png)
![$^{-2}$](img17.png)
![$B$](img175.png)
![$^2$](img57.png)
![$k$](img71.png)
![$k$](img71.png)
![$B$](img175.png)
![$k$](img71.png)
![$B$](img175.png)
The following example shows how to compute the solvent mask:
The next example shows how to test various scale and B-factors.
Note that this protocol has to be run several times with different
trial scale factors and B-factors. One should look at
low values for the low-resolution bins while maintaining low
values for the high-resolution bins. This is a somewhat
subjective procedure, which is the reason why this protocol is
not automated.
In subsequent protocols, one should include the
following lines before computing values, crystallographic
targets, or electron density maps:
reflection @amy_s end {*Reflection file with solvent mask FPART.*} resolution 40. 2. do ( FPART= 0.4 * exp(-200*(s()^2)/4.)*FPART )
Xplor-NIH 2024-09-13